RV College of Engineering Literature Survey Go, change the world * Department of ECE 9 Sl No Paper Title, Journal Name, Year Major findings / observations 1 J. A. Sethian and D. Adalsteinsson , "An overview of level set methods for etching, deposition, and lithography development," in IEEE Transactions on Semiconductor Manufacturing, vol. 10, no. 1, pp. 167-184, Feb. 1997, doi : 10.1109/66.554505. In the case of photoresist development and isotropic etching/deposition, the fast marching level set method. In the case of more complex etching and deposition, the narrow band level set method 2 J. Nduhura-Munga , G. Rodriguez- Verjan , S. Dauzère-Pérès , C. Yugma , P. Vialletelle and J. Pinaton , "A Literature Review on Sampling Techniques in Semiconductor Manufacturing," in IEEE Transactions on Semiconductor Manufacturing, vol. 26, no. 2, pp. 188-195, May 2013, doi : 10.1109/TSM.2013.2256943. Sampling techniques are classified into three main groups: static, adaptive, and dynamic Benefits and drawbacks of each group are discussed, showing significant improvements from static to dynamic through adaptive sampling techniques.