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ShibaSankarDash 17 views 94 slides Oct 10, 2024
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About This Presentation

SEM


Slide Content

MR306
Electron Microscopy in Materials Characterization
 General Introduction, Resolution, Limits on resolution, Lens aberrations
 Introduction to SPM/SEM, Electron Optics – Electron Guns and Lenses,
Probe diameter and probe current
 Electron-Specimen Interactions, Interaction volume, elastic and inelastic
scattering
 Basics of SEM imaging, Imaging modes, Detectors, Image contrast, Image
processing
 XEDS and WDS – Principles and practice, Basics
 Case studies in Materials Science – Imaging and Analysis
 Newer Techniques – EBSD, LVSEM, ESEM
 Sample Preparation and a special note about digital imaging/processing

‘Cooking‘
This is the material scientist’s kitchen cupboard

Structure
Type of atom
Bonding between atoms
How the atoms are arranged
Iron – Body Centred Cubic

Nanotube
FullereneDiamond
Graphite
Same ‘material’

Crystal Structure and Properties
Iron
-Fe – magnetic (BCC)
-Fe – Non-magnetic (FCC)
Carbon
Graphite – soft lubricant
Diamond – hard cutting tool

Microstructure
Many unit cells
Defects
Grains

Pentium® II processor
Multilevel wiring scheme
0.18 m
A more complicated, designed ‘microstructure’

Processing
Melting and Casting
Mechanical Working
Thin Film Deposition
Heat Treatment
and so on…
By a suitable choice of processing,
we can change the microstructure
eg: reduce the grain size
Heating and Beating!

Materials Science Tetrahedron
Microstructure

Microscope
Used to ‘see’ objects not visible to the human eye
 
Eye can ‘resolve’ objects ~ 0.1mm apart
For anything closer, we need a means of magnifying
 
Note : BIG difference between ‘seeing’ and ‘resolving’
 
Seeing a car approaching (from its headlights)
Resolving the two headlights as separate sources of light
 
Optical System - Components
Source of Radiation - Visible-light
System of lenses and apertures

Resolution
Limit to resolution arises from the phenomenon
of diffraction
Any system used to form an image uses lenses and
apertures that have a certain dimension
Diffraction from a single slit
Intensity ~ (sin(x)/x)
2
A big maxima surrounded by smaller maxima
Point object is not mapped on to a point - spread out

‘Image’ of a circular slit

Rayleigh Criterion
Profiles from two adjacent point will overlap
To be able to resolve two points as distinct
This is the diffraction-limited resolution limit

R
= sin
-1
(1.22/d)
To increase resolution
Large d
Small 

Resolution
20/20 Vision
In the term "20/20 vision", the
numerator refers to the distance
in feet between the subject and
the chart. The denominator is the
distance at which the lines that
make up those letters would be
separated by a visual angle of 1
arc minute, which for the lowest
line that is read by an eye with no
refractive error

Images at different resolution

Limits on Resolution
What diameter of telescope would you require to read
the numbers on a license plate from a spy satellite?

Lens Aberrations - Other limiting factors for resolution

Spherical Aberration
Zero
+
-

Spherical Aberration

Astigmatism – ‘circle’ becomes an ‘ellipse’

Chromatic Aberration
No
Aberration
Chromatic
Aberration

Electron moving with a velocity ‘v’ has a wavelength
associated with it
 = h/mv ~ 12.247/sqrt(E)(V)
Electrons as Waves - The particle-wave duality
Typical wavelengths
E 
100 kV 0.037 A
200 kV 0.025 A

First ‘Commercial’ SEM

‘Old’ SEM
Modern day SEM

Basics of SEM Operation
•Electron gun produces a ‘beam’
Thermionic/Field-emission guns
•Produce a ‘tight’ spot on the specimen surface
Condenser and Objective lenses
•Scanning coils ‘raster’ the beam across the specimen
Size of scan -> Magnification
•Electron-specimen interactions
Produces a wide variety of signals
•Detectors to collect the signal
Different detectors for different signals
 

MagnificationMagnification
Magnification Area on SamplePixel Size
10x 1 cm x 1 cm 10 mm
100x 1 mm x 1 mm 1 mm
10kx 10 m x 10 m 10 nm
100kx 1 m x 1 m 1 nm
Magnification = D/d

Electron Gun

Thermionic Emission
J
c
= A
c
T
2
exp(-E
w
/kT)
Richardson Equation
Use ‘thermal’ energy to excite electrons from a metal
E
F
E
W
vacuum
E
w
= 4.5 eV for W, at
T = 2700 K
J = 3.4 A/cm
2

Tungsten
Hairpin
Filament
Work Function = 4.5 eV

This is what happens when
you turn the filament knob

Effect of bias on the
filament emission

Other possible ‘gun materials’

LaB
6

LaB
6
Filament
Work Function = 2.5 eV

Very high electric fields
Tip with small radius of curvature
Field Emission

Field Emission
Gun

Comparison of Electron Sources
(Brightness = Current/area/solid angle)

Source Brightness
(A/cm
2
sr)
Source
Size
Lifetime
(h)
Vacuum
Level
Tungsten
filament
(4.5 eV)
10
5
30-100 m 40-100 10
-5
Torr
LaB
6 <100>
(2.5 ev)
10
5
5-50 m 200-1000 10
-7
Torr
Cold FE 10
8
< 5nm > 1000 10
-10
Torr
Thermal FE 10
8
< 5 nm > 1000 10
-9
Torr
Schottky 10
8
15-30 nm > 1000

Lenses in the Electron Microscope

Electromagnetic Lens

Two types of
Objective Lenses
Large working distance
Very small working
distance
(
a)Pin-hole lens – variable working distance, no size limitation of sample,
good depth of field
(b) Small focal length => High Resolution

aberrations
Asymmetric

Demagnification

aberrations

Weak
condenser
lens
Strong
condenser
lens

Small
working
distance
Large
working
distance

Three important parameters for image formationThree important parameters for image formation
Probe Size -
Smaller the probe size, higher the resolution
Smaller the probe size, lower the brightness
Probe Current/Brightness -
Imaging requires ‘large’ currents
Convergence Angle –
Depth of field increases as angle decreases
Aberrations decrease as angle decreases
Brightness decreases as angle decreases
Probe Size d
p
– diameter of beam as it falls on the specimen
Brightness  – Current density/solid angle
Probe convergence 
p
– angle made by the cone of electrons with the central axis at the sample surface

Astigmatism

Astigmatism

Astigmatism

Astigmatism

Comparison of Electron Sources
Note that a very small FE probe carries a much larger current
compared to a W filament.
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