▪Nanomaterials/nanoparticlesarepreparedthroughdiverserangeofsynthesis
approacheslikelithographictechniques,ballmilling,etching,andsputtering
▪Synthesis/Fabricationofnanomaterialswithtailoredpropertiesinvolvethecontrolof
size,shape,structure,compositionandpurityoftheirconstituents
▪Hencethenanomaterialpropertiescanbetunedasdesiredviapreciselycontrollingthe
size,shape,synthesisconditions,andappropriatefunctionalization.
Synthesis of Nanomaterials
Top-down approaches
Slicing of a bulk material to get nano sized particles
Bottom-up approaches
Build up materials atom by atom
(in which nanoparticles are grown from simpler molecules)
Fabrication of nanomaterials include nanostructured surface, nanoparticles
and nanoporous materials
Nanoparticles are typically synthesized from
a top-down or bottom-up approach
Approaches for the synthesis of nanomaterials
Electrospinning
▪simplesttop-downmethod
▪usedtoproducenanofibersfromawidevarietyofmaterials,typicallypolymers.
▪Lengthsoftheseultrathinnanomaterialscanbeextendedtoseveralcentimeters.
▪Core–shellandhollowpolymer,inorganic,organic,andhybridmaterials
An electrostatic potential is
applied between a
spinneret and a collector
https://www.sciencedirect.com/scie
nce/article/pii/S136970210671389X
Lithography
Auseful tool for developing nanoarchitectures using a
focused beam of light or electrons
Mask less lithography
▪Inmasklesslithography,
arbitrarynanopatternwritingis
carriedoutwithoutthe
involvementofamask
▪3Dfreeformmicro-nano-
fabricationcan be
achievedviaionimplantation
withafocusedionbeamin
combinationwithwetchemical
etching
▪Includesscanningprobe
lithography,focusedionbeam
lithography,andelectronbeam
lithography
https://link.springer.com/referenceworkentry/10.1007%2F978-0-387-92897-5_1051
Masked lithography
In masked
nanolithography,nano-
patternsaretransferred
overalargesurfacearea
usingaspecificmaskor
template.
Includesphotolithography,
nano-imprintlithography&
softlithography