X rays lithography

11,900 views 14 slides Oct 22, 2017
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About This Presentation

An overview, advantages and disadvantages of X-Rays Lithography


Slide Content

X-Ray
Photolithography

Contents
Lithography
Lithographic Process
X-Ray Photolithography
Sources of X-Rays
i) Electron Impact X-Ray Sources
ii) Synchrotron X-ray source
Procedure of X-Ray Photolithography
Advantages
Applications
Limitations

Lithography is the process of printing
patterns onto a thin film called resist, using
localized interaction between this layer and
the particle beam.
What Is Lithography

G. D. Hutcheson, et al., Scientific American, 274, 54 (1996).
Lithographic Process

X-RayPhotolithographyisaprocess
whichusesX-raystotransferageometric
patternfromamasktotheresistonthe
substrate.
X-ray Photolithography

Sources of X-rays
1)Electron Impact X-Ray
Sources
E-beam accelerated at high energy
by the metals anode.
By striking the target x-rays are
emitted.
Fig1Electron beam Impact X-Ray source

2) Synchrotron X-ray source
Fig 2 Synchrotron X-ray source
Sources of X-rays

Procedure of X-Ray Photolithography
PMMA is applied to the surface of silicon
wafer
PMMA hardens when contacted with x-
rays
X-ray mask is applied on top of silicon
wafer before exposure
Absorber
Membrane
Synchrotron radiation (0.2 –2 nm)
Gap between substrate and mask
Fig 3: Procedures of X-Ray Lithography

Proximity mask
Fig 4: X-Ray Lithography use only Proximity mask

Less diffraction effect
High Resolution.
Large Area (Large
depth of focus )
Excellent resist profiles
R. Waser(ed.), Nanoelectronicsand Information Technology, Chapter 9
Advantages
Fig 5: Patterns produced by x-ray photolithography

For febricationof gigabit DRAM.
Applications
Fig 6: Photograph of DRAM
J. Zyss(Ed.): Photonique Mol´eculaire: Mat´eriaux, Physique et Composants, C.R. Physique 3,
No. 4 (2002)

Used in the MEMS(micro-electro mechanical
systems) technology.
Fig 7: Photograph of MEMS
Applications
SunneyXie, X., and Trautman, J.K.: Ann. Rev. Phys. Chem. 49, 441–480 (2008)

Thin Lens
Distortion in absorber
Cannot be focused through lens
Masks are expensive to produce
Limitations

Thanxxx…..